PRODUCTS

HEXAMETHYLDISILAZANE (HMDS)

Hexamethyldisilazane (HMDS) is a stable and effectivereagent for trimethylsilylation of hydrogen-labile substrates such as alcohols,amines, and carboxylic acids.
Hexamethyldisilazane is commonly used for the protection of sensitivefunctional groups during chemical synthesis.
Owing to Hexamethyldisilazane low cost, high vapor pressure, and safety, Hexamethyldisilazane is widely used as a precursor in chemical vapor deposition(CVD) reactions.

CAS Number: 999-97-3
EC Number: 213-668-5
Molecular Formula: C6H19NSi2
Molecular Weight (g/mol): 161.395

Hexamethyldisilazane (HMDS) is used to trimethylsilylate alcohols, amines, thiols.
Hexamethyldisilazane can also be used for the preparation of trimethylsilyl ethers from hydroxy compounds

Hexamethyldisilazane is used as a solvent in organic synthesis and organometallic chemistry.
Hexamethyldisilazane is often used as an adhesion promoter for photoresist in photolithography.
Further, Hexamethyldisilazane is used for the preparation of trimethylsilyl ethers from hydroxy compounds.

Hexamethyldisilazane is used as an alternative to critical point drying during sample preparation in electron microscopy.
Hexamethyldisilazane is added to analyte to get silylated diagnostic products during pyrolysis in gas chromatography- mass spectrometry.

Bis(trimethylsilyl)amine (also known as hexamethyldisilazane and HMDS) is an organosilicon compound with the molecular formula [(CH3)3Si]2NH.
The molecule is a derivative of ammonia with trimethylsilyl groups in place of two hydrogen atoms.

An electron diffraction study shows that silicon-nitrogen bond length (173.5 pm) and Si-N-Si bond angle (125.5°) to be similar to disilazane (in which methyl groups are replaced by hydrogen atoms) suggesting that steric factors are not a factor in regulating angles in this case.
This colorless liquid is a reagent and a precursor to bases that are popular in organic synthesis and organometallic chemistry.
Additionally, Hexamethyldisilazane is also increasingly used as molecular precursor in chemical vapor deposition techniques to deposit silicon carbonitride thin films or coatings.

Hexamethyldisilazane can be, at times, a good substitute for critical point drying CPD, especially for those laboratories not having available a good critical point dryer.
Because of Hexamethyldisilazane generally rapid infiltration, Hexamethyldisilazane is ideal for the preparation of insect tissue.
However, do not expect the results, in general, to be as one would get with the use of a good critical point dryer.

Remember, we "recommend" the use of Hexamethyldisilazane only when a good operating CPD unit is just not available.
Until recently, the main application for Hexamethyldisilazane has been in life science microscopy but in more recent years, interesting applications in materials science have been found.

Hexamethyldisilazane also known as HDMS, is an organosilicon compound and molecule derived from ammonia.
Hexamethyldisilazane is a colorless liquid which is popular in organometallic chemistry and organic synthesis.

Hexamethyldisilazane appears as a liquid. May be toxic by ingestion.
Hexamethyldisilazane is irritates skin and eyes.

Hexamethyldisilazane is may emit highly toxic nitrogen oxide fumes when heated to decomposition.
Hexamethyldisilazane is used to deactivate chromatography support materials and to promote adhesion of photoresists in the electronics industry.

Hexamethyldisilazane can be used in place of critical point drying for the preparation of soft tissue for SEM examination, for example, of delicate insect tissues.
Hexamethyldisilazane is faster, preserves surface detail, reduces thermal and pressure stresses, and may also reduce the extraction of cellular components compared with CPD.
Hexamethyldisilazane can be used to dry specimens such as bacteria on polycarbonate filters.

Hexamethyldisilazane is a bulk organo silicon compound, being a quite useful silanizing agent.
Hexamethyldisilazane is a reagent for the preparation of trimethylsilyl derivatives.

Hexamethyldisilazane can also be used to dehydrate cells of biomaterials for scanning electron microscopy (SEM).
Moreover, Hexamethyldisilazane is an adhesion promoter for photoresist in photolithography, and is also useful in the pyrolysis-gas chromatography-mass spectrometry to enhance the detectability of compounds with polar functional groups.

Hexamethyldisilazane is a derivative of ammonia with trimethylsilyl groups in place of two hydrogen atoms.
Hexamethyldisilazane is primarily used as a precursor to many bases common in organic synthesis and organometallic chemistry.
Hexamethyldisilazane also has applications in photolithography, electron microscopy and pyrolysis-gas chromatography-mass spectrometry.

Hexamethyldisilazane is an N-silyl compound obtained from ammonia by replacement of two of the hydrogens with trimethylsilyl groups.
Hexamethyldisilazane is a derivatisation agent used in gas chromatography mass spectrometry applications.

Hexamethyldisilazane has a role as a chromatographic reagent.
Hexamethyldisilazane derives from a hydride of an ammonia.

Hexamethyl disilazane appears as a liquid.
Hexamethyldisilazane is may be toxic by ingestion.

Hexamethyldisilazane is irritates skin and eyes.
Hexamethyldisilazane is may emit highly toxic nitrogen oxide fumes when heated to decomposition.
Hexamethyldisilazane is used to make other chemicals.

Uses of Hexamethyldisilazane:
Hexamethyldisilazane mainly used as methyl silane alkylation (such as amikacin, penicillin, cephalosporins and kinds of penicillin derivatives), hydroxyl protectants of antibiotics.
Hexamethyldisilazane is used as surface treatment agent of diatomite, white carbon black, titanium and blond additives of photoresist in the semiconductor industry.

Hexamethyldisilazane is used as treatment agent of tearing strength resistance.
Hexamethyldisilazane is used as a solvent in organic synthesis and organometallic chemistry.

Hexamethyldisilazane is used as an adhesion promoter for photoresist in photolithography.
Hexamethyldisilazane is used for the preparation of trimethylsilyl ethers from hydroxy compounds.

Hexamethyldisilazane is used to deactivate chromatography support materials and to promote adhesion of photoresists in the electronics industry.
Hexamethyldisilazane is used in electronic industry as an adhesion promoter for photoresists on silicon.

Hexamethyldisilazane is used as a chemical intermediate in the production of siloxane polymers.

Use as reagent:

Hexamethyldisilazane is employed as a reagent in many organic reactions:
Hexamethyldisilazane is used as a reagent in condensation reactions of heterocyclic compounds such as in the microwave synthesis of a derivative of xanthine.

The Hexamethyldisilazane mediated trimethylsilylation of alcohols, thiols, amines and amino acids as protective groups or for intermediary organosilicon compounds is found to be very efficient and replaced TMSCl reagent.
Silylation of glutamic acid with excess hexamethyldisilazane and catalytic TMSCl in either refluxing xylene or acetonitrile followed by dilution with alcohol (methanol or ethanol) yields the derived lactam pyroglutamic acid in good yield.

Hexamethyldisilazane in the presence of catalytic iodine facilitates the silylation of alcohols in excellent yields.

Hexamethyldisilazane can be used to silylate laboratory glassware and make Hexamethyldisilazane hydrophobic, or automobile glass, just as Rain-X does.
In gas chromatography, Hexamethyldisilazane can be used to silylate OH groups of organic compounds to increase volatility, this way enabling GC-analysis of chemicals that are otherwise non-volatile.

Other Uses:
In photolithography, Hexamethyldisilazane is often used as an adhesion promoter for photoresists.
Best results are obtained by applying Hexamethyldisilazane from the gas phase on heated substrates.

In electron microscopy, Hexamethyldisilazane can be used as an alternative to critical point drying during sample preparation.
In pyrolysis-gas chromatography-mass spectrometry, Hexamethyldisilazane is added to the analyte to create silylated diagnostic products during pyrolysis, in order to enhance detectability of compounds with polar functional groups.

In plasma-enhanced chemical vapor deposition (PECVD), Hexamethyldisilazane is used as a molecular precursor as a replacement to highly flammable and corrosive gasses like SiH4, CH4, NH3 as Hexamethyldisilazane can be easily handled.
Hexamethyldisilazane is used in conjunction with a plasma of various gases such as argon, helium and nitrogen to deposit SiCN thin films/coatings with excellent mechanical, optical and electronic properties.

Industry Uses:
Adhesion/cohesion promoter
Adhesives and sealant chemicals
Chemical reaction regulator
Intermediate
Intermediates
Polymerization promoter
Processing aids not otherwise specified
Processing aids, not otherwise listed
Viscosity modifiers

Consumer Uses:
Intermediate
Polymerization promoter

Industrial Processes with risk of exposure:
Semiconductor Manufacturing

Applications of Hexamethyldisilazane:
Hexamethyldisilazane is used as a solvent in organic synthesis and organometallic chemistry.
Hexamethyldisilazane is often used as an adhesion promoter for photoresist in photolithography.
Further, Hexamethyldisilazane is used for the preparation of trimethylsilyl ethers from hydroxy compounds.

Hexamethyldisilazane (HMDS) can be used:
As a silylating agent in the trimethylsilylation of alcohols under nearly neutral reaction conditions.
To control the molecular weights of polypeptides during ring-opening polymerization of α-amino acid N-carboxyanhydrides.

To fabricate silicon carbonitride thin films by plasma-enhanced CVD.
For specimen preparation for scanning electron microscopy and the preparation of trimethylsilyl ethers from hydroxy compounds.

Silanization of glass surfaces:
Glass microscope slides can be made hydrophobic using Hexamethyldisilazane.
The procedure is simple and works quite well.

Place the slides, separated, in a wide mouth glass jar preferable with a PTFE lined cap.
Add a few drops of the Hexamethyldisilazane which will then vaporize in the sealed jar reacting with the surface of the slides.
Better results are obtained if this is done while keeping the jar at 70° for twelve hours, but with the cap slightly ajar.

At the end of the twelve hours, remove the slides.
Water droplets will now "bead up" on the slide surfaces.
The layer responsible for the hydrophobic behavior with we less than one nm in thickness and will also be completely invisible to the eye.

Applications in semiconductor technology:
Hexamethyldisilazane is an outstanding adhesion promoter especially in terms of improving the adhesion of photoresist to the wafer surface.
Hexamethyldisilazane is deposited on the wafer surface prior to the deposition of resist.

Applications in nanotechnology:
The preparation of non-interacting and non-touching nanoparticles is one of the biggest challenges faced by workers in this field of research.
For those interested in the controlled synthesis of non-aggregated nanoparticles with diameters between 1 and 50 nm, one can synthesize nanosize SiO2 particles from Hexamethyldisilazane as precursor and oxygen as the oxidizing agent.

Features and Benefits of Hexamethyldisilazane:
High chemicalstability and low molecular weight
Nontoxic andcost-effective reagent

Ammonia is theonly byproduct generated during silylation
Silylationreaction using HDMS is nearly neutral and does not need any precaution

Properties of Hexamethyldisilazane:

Chemical Properties:
Hexamethyldisilazane, also known as HMDS, is an important organosilicon compound, a colorless and transparent liquid.
Hexamethyldisilazane is readily hydrolyzed and gives off NH3 to produce hexamethyldisilyl ether.

In the presence of a catalyst, Hexamethyldisilazane reacts with alcohols or phenols to produce trimethylalkoxysilane or trimethylaroxysilane.
Reacts with anhydrous hydrogen chloride, releasing NH3 or NH4Cl, to produce trimethylchlorosilane.

Physical properties:
Colorless transparent and easy flowing liquid.
Boiling point 125℃, relative density 0.76 (20/4℃).
Soluble in organic solvents, Hexamethyldisilazane will be rapidly hydrolyzed in contact with air to form trimethylsilanol and hexamethyldisilyl ether.

Synthesis and Derivatives of Hexamethyldisilazane:
Bis(trimethylsilyl)amine is synthesized by treatment of trimethylsilyl chloride with ammonia:
2 (CH3)3SiCl + 3 NH3 → [(CH3)3Si]2NH + 2 NH4Cl

Ammonium nitrate together with triethylamine can be used instead.
This method is also useful for 15N isotopic enrichment of Hexamethyldisilazane.

Alkali metal bis(trimethylsilyl)amides result from the deprotonation of bis(trimethylsilyl)amine.
For example, lithium bis(trimethylsilyl)amide (LiHMDS) is prepared using n-butyllithium:
[(CH3)3Si]2NH + BuLi → [(CH3)3Si]2NLi + BuH

LiHMDS and other similar derivatives: sodium bis(trimethylsilyl)amide (NaHMDS) and potassium bis(trimethylsilyl)amide (KHMDS) are used as a non-nucleophilic bases in synthetic organic chemistry.

General Manufacturing Information of Hexamethyldisilazane:

Industry Processing Sectors:
Adhesive Manufacturing
All Other Basic Inorganic Chemical Manufacturing
All Other Basic Organic Chemical Manufacturing
All Other Chemical Product and Preparation Manufacturing
Computer and Electronic Product Manufacturing
Electrical Equipment, Appliance, and Component Manufacturing
Other (requires additional information)
Paint and Coating Manufacturing
Pharmaceutical and Medicine Manufacturing
Plastics Material and Resin Manufacturing
Printing and Related Support Activities
Rubber Product Manufacturing
Synthetic Rubber Manufacturing

Stability and Reactivity of Hexamethyldisilazane:

Reactivity:
None known, based on information available.

Chemical stability:
Stable under normal conditions, Moisture sensitive.

Possibility of hazardous reactions

Hazardous Polymerization:
Hazardous polymerization does not occur.

Hazardous Reactions:
None under normal processing.

Conditions to avoid:
Incompatible products.
Excess heat.

Keep away from open flames, hot surfacesandsources of ignition.
Exposure to moist air or water.

Incompatible materials:
Strong oxidizing agents.
Water.

Hazardous decomposition products:
Carbon monoxide (CO).
Carbon dioxide (CO2).

Handling and Storage of Hexamethyldisilazane:

Nonfire Spill Response:
ELIMINATE all ignition sources (no smoking, flares, sparks or flames) from immediate area.
All equipment used when handling Hexamethyldisilazane must be grounded.

Do not touch or walk through spilled material.
Stop leak if you can do Hexamethyldisilazane without risk.

Prevent entry into waterways, sewers, basements or confined areas.
A vapor-suppressing foam may be used to reduce vapors.

Absorb with earth, sand or other non-combustible material.
For hydrazine, absorb with DRY sand or inert absorbent (vermiculite or absorbent pads).
Use clean, non-sparking tools to collect absorbed material.

LARGE SPILL:
Dike far ahead of liquid spill for later disposal.
Water spray may reduce vapor, but may not prevent ignition in closed spaces.

First Aid Measures of Hexamethyldisilazane:
Call 911 or emergency medical service.
Ensure that medical personnel are aware of the material(s) involved and take precautions to protect themselves.

Move victim to fresh air if Hexamethyldisilazane can be done safely.
Give artificial respiration if victim is not breathing.

Do not perform mouth-to-mouth resuscitation if victim ingested or inhaled Hexamethyldisilazane; wash face and mouth before giving artificial respiration.
Use a pocket mask equipped with a one-way valve or other proper respiratory medical device.

Administer oxygen if breathing is difficult.
Remove and isolate contaminated clothing and shoes.

In case of contact with substance, immediately flush skin or eyes with running water for at least 20 minutes.
In case of burns, immediately cool affected skin for as long as possible with cold water.

Do not remove clothing if adhering to skin.
Keep victim calm and warm.
Effects of exposure (inhalation, ingestion or skin contact) to substance may be delayed.

Fire Fighting of Hexamethyldisilazane:
Some of these materials may react violently with water.

SMALL FIRE:
Dry chemical, CO2, water spray or alcohol-resistant foam.

LARGE FIRE:
Water spray, fog or alcohol-resistant foam.
If Hexamethyldisilazane can be done safely, move undamaged containers away from the area around the fire.

Dike runoff from fire control for later disposal.
Do not get water inside containers.

FIRE INVOLVING TANKS OR CAR/TRAILER LOADS:
Fight fire from maximum distance or use unmanned master stream devices or monitor nozzles.
Cool containers with flooding quantities of water until well after fire is out.

Withdraw immediately in case of rising sound from venting safety devices or discoloration of tank.
ALWAYS stay away from tanks engulfed in fire.

For massive fire, use unmanned master stream devices or monitor nozzles.
If this is impossible, withdraw from area and let fire burn.

Accidental Release Measures of Hexamethyldisilazane:

IMMEDIATE PRECAUTIONARY MEASURE:
Isolate spill or leak area for at least 50 meters (150 feet) in all directions.

SPILL:
Increase the immediate precautionary measure distance, in the downwind direction, as necessary.

FIRE:
If tank, rail car or tank truck is involved in a fire, ISOLATE for 800 meters (1/2 mile) in all directions.
Also, consider initial evacuation for 800 meters (1/2 mile) in all directions.

Disposal Methods of Hexamethyldisilazane:
The most favorable course of action is to use an alternative chemical product with less inherent propensity for occupational exposure or environmental contamination.
Recycle any unused portion of the material for Hexamethyldisilazane approved use or return Hexamethyldisilazane to the manufacturer or supplier.

Ultimate disposal of the chemical must consider:
The material's impact on air quality; potential migration in soil or water; effects on animal, aquatic, and plant life; and conformance with environmental and public health regulations.

Preventive Measures of Hexamethyldisilazane:
The scientific literature for the use of contact lenses in industry is conflicting.
The benefit or detrimental effects of wearing contact lenses depend not only upon Hexamethyldisilazane, but also on factors including the form of Hexamethyldisilazane, characteristics and duration of the exposure, the uses of other eye protection equipment, and the hygiene of the lenses.
However, there may be individual substances whose irritating or corrosive properties are such that the wearing of contact lenses would be harmful to the eye.

In those specific cases, contact lenses should not be worn.
In any event, the usual eye protection equipment should be worn even when contact lenses are in place.

Identifiers of Hexamethyldisilazane:
CAS Number: 999-97-3
Abbreviations: HMDS
Beilstein Reference: 635752
ChEBI: CHEBI:85068
ChemSpider: 13238
ECHA InfoCard: 100.012.425
EC Number: 213-668-5
MeSH: Hexamethylsilazane

PubChem CID:
13838
18913873 amine
45051731 sodium
45051783 potassium

RTECS number: JM9230000
UNII: H36C68P1BH
UN number: 2924, 3286
CompTox Dashboard (EPA): DTXSID2025395
InChI: InChI=1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
Key: FFUAGWLWBBFQJT-UHFFFAOYSA-N check
InChI=1/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
Key: FFUAGWLWBBFQJT-UHFFFAOYAF

SMILES:
C[Si](C)(C)N[Si](C)(C)C
N([Si](C)(C)C)[Si](C)(C)C

Synonym(s): Bis(trimethylsilyl)amine, HMDS
Linear Formula: (CH3)3SiNHSi(CH3)3
CAS Number: 999-97-3
Molecular Weight: 161.39
Beilstein: 635752
EC Number: 213-668-5
MDL number: MFCD00008259
PubChem Substance ID: 24867576
NACRES: NA.23

EC Number: 213-668-5
EC Name: 1,1,1,3,3,3-hexamethyldisilazane
CAS Number: 999-97-3
Molecular formula: C6H19NSi2
IUPAC Name: bis(trimethylsilyl)amine

CAS number: 999-97-3
EC number: 213-668-5
Hill Formula: C₆H₁₉N Si₂
Molar Mass: 133.49 g/mol
HS Code: 2931 90 00

CAS: 999-97-3
Molecular Formula: C6H19NSi2
Molecular Weight (g/mol): 161.395
MDL Number: MFCD00008259
InChI Key: FFUAGWLWBBFQJT-UHFFFAOYSA-N
PubChem CID: 13838
ChEBI: CHEBI:85068
IUPAC Name: [dimethyl-(trimethylsilylamino)silyl]methane
SMILES: C[Si](C)(C)N[Si](C)(C)C

Properties of Hexamethyldisilazane:
Chemical formula: C6H19NSi2
Molar mass: 161.395 g·mol−1
Appearance: Colorless liquid
Density: 0.77 g cm−3
Melting point: −78 °C (−108 °F; 195 K)
Boiling point: 126 °C (259 °F; 399 K)
Solubility in water: Slow hydrolysis
Refractive index (nD): 1.4090

Boiling point: 126 °C (1013 mbar)
Density: 0.77 g/cm3 (20 °C)
Explosion limit: 0.8 - 25.9 %(V)
Flash point: 11.4 °C
Ignition temperature: 325 °C
Melting Point: -82 °C
pH value: >7.0 (H₂O)
Vapor pressure: 1900 Pa (20 °C)
Viscosity kinematic: 0.9 mm2/s (25 °C)

Melting point: -78 °C
Boiling point: 125 °C (lit.)
Density: 0.774 g/mL at 25 °C(lit.)
vapor density: 4.6 (vs air)
vapor pressure: 20 hPa (20 °C)
refractive index: n20/D 1.407(lit.)
Flash point: 57.2 °F
storage temp.: Store below +30°C.
solubility: Miscible with acetone, benzene, ethyl ether, heptane and perchloroethylene.
pka: 30(at 25℃)
form: Liquid
color: Colorless
Specific Gravity: 0.774
Odor: Ammonia odour
PH Range: 8.5
Evaporation Rate: < 1
Viscosity: 0.9mm2/s
explosive limit: 0.8-25.9%(V)
Water Solubility: REACTS
Sensitive: Moisture Sensitive
Hydrolytic Sensitivity: 7: reacts slowly with moisture/water
Merck: 14,4689
BRN: 635752
InChIKey: FFUAGWLWBBFQJT-UHFFFAOYSA-N
LogP: 0.23-1.19 at 20-25℃

Grade: reagent grade
Quality Level: 300
Assay: ≥99%
Form: liquid
Refractive index: n20/D 1.407 (lit.)
bp: 125 °C (lit.)
SMILES string: C[Si](C)(C)N[Si](C)(C)C
InChI: 1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
InChI key: FFUAGWLWBBFQJT-UHFFFAOYSA-N

Molecular Weight: 161.39
Hydrogen Bond Donor Count: 1
Hydrogen Bond Acceptor Count: 1
Rotatable Bond Count: 2
Exact Mass: 161.10560268
Monoisotopic Mass: 161.10560268
Topological Polar Surface Area: 12 Å²
Heavy Atom Count: 9
Complexity: 76.2
Isotope Atom Count: 0
Defined Atom Stereocenter Count: 0
Undefined Atom Stereocenter Count: 0
Defined Bond Stereocenter Count: 0
Undefined Bond Stereocenter Count: 0
Covalently-Bonded Unit Count: 1
Compound Is Canonicalized: Yes

Specifications of Hexamethyldisilazane:
Assay (GC, area%): ≥ 98 %
Density (d 20 °C/ 4 °C): 0.774 - 0.775
Identity (IR): passes test

Melting Point: -78°C
Density: 0.774
Boiling Point: 126°C
Flash Point: 8°C (46°F)
Assay Percent Range: 98+%
Linear Formula: (CH3)3SiNHSi(CH3)3
Odor: Odorless
UN Number: UN3286
Beilstein: 635752
Merck Index: 14,4689
Refractive Index: 1.408
Quantity: 100 mL
Solubility Information: Miscible with methanol,chloroform,ethyl ether and benzene. Immiscible with water.
Sensitivity: Moisture sensitive
Formula Weight: 161.4
Percent Purity: ≥98%
Physical Form: Liquid
Chemical Name or Material: Hexamethyldisilazane

Related Products of Hexamethyldisilazane:
Disperse Red 1 (Technical Grade)
Disperse Red 1-D3
4-(4-Diethylaminostyryl)-1-methylpyridinium iodide
Dimethyloctadecyl[3-(trimethoxysilyl)propyl]ammonium Chloride (40-50 wt. % in methanol)
1,1′-Diethyl-4,4′-cyanine Iodide

Names of Hexamethyldisilazane:

Preferred IUPAC name:
1,1,1-Trimethyl-N-(trimethylsilyl)silanamine

Trade names:
1,1,1,3,3,3-Hexamethyldisilazan
A-166
Dow Corning(R) 4-2839 INT (PL fluid)
Dow Corning(R) Z-6079 silazane
Dynasylan(R) HMDS
Hexamethyldisilazane
SC3100Z
SH4002ZNC911
SH8270U
SH9151U
SH9161U
SL2501A
SL3358A
SL3358B
SL7230A
SL7230B
SL7240A
SL7240B
SL7250ATT903
SL7250ATT905
SL7250BTT903
SL7250BTT905
SL7260A
SL7260ATT903
SL7260ATT907
SL7260B
SL7260BTT903
SL7260BTT907
SL7270A
SL7270ATT903
SL7270B
SL7270BTT903
SL8601ACG791
SL8601ACG792
SL8601BCG791
SL8601BCG792
SL8609A
SL8609ACG792
SL8609B
SL8609BCG792
SL8640A
SL8640B
SL9051A
SL9051B
SL9055A
SL9055B
SL9340A
SL9340B
SL9805ARM102
SM8110Z
SM8120Z

Other names:
Bis(trimethylsilyl)azane
Bis(trimethylsilyl)amine
1,1,1,3,3,3-Hexamethyldisilazane
Hexamethyldisilazane

Synonyms of Hexamethyldisilazane:
Hexamethyldisilazane
999-97-3
HMDS
Bis(trimethylsilyl)amine
1,1,1,3,3,3-Hexamethyldisilazane
Hexamethylsilazane
Silanamine, 1,1,1-trimethyl-N-(trimethylsilyl)-
1,1,1-Trimethyl-N-(trimethylsilyl)silanamine
Tri-Sil
TSL 8802
hexamethyl disilazane
Disilazane, 1,1,1,3,3,3-hexamethyl-
[dimethyl-(trimethylsilylamino)silyl]methane
NSC 93895
CCRIS 2456
SZ 6079
HSDB 7226
(TMS)2NH
EINECS 213-668-5
MFCD00008259
((CH3)3Si)2NH
H36C68P1BH
CHEBI:85068
1,1,3,3,3-Hexamethyldisilazane
Bis(trimethylsilyl)amidolithium
NSC-93895
Trimethyl-N-(trimethylsilyl)silanamine
OAP
Lithium hexamethyldisilazane
Lithiumbis(trimethylsilyl)amine
hexamethyldisilazane (hmds)
hexamethyldisilizane
Lithium tris(trimethylsilyl)amine
27495-70-1
CAS-999-97-3
NSC-252161
UNII-H36C68P1BH
AI3-51467
hexamethyldisilazan
hexamethyidisilazane
hexa-methyldisilazane
hexamethyl-disilazane
bistrimethylsilylamine
hexamethyldisilylamine
Me3SiNHSiMe3
HMDZ
bis-(trimethylsilyl)amine
(Me3Si)2NH
1,1,1,3,3,3-HEXAMETHYL-DISILAZANE
EC 213-668-5
DISILAZANE,HEXAMETHYL
HN(TMS)2
SCHEMBL7649
CHEMBL3183662
DTXSID2025395
HEXAMETHYLDISILAZANE [MI]
1,1,3,3,3-hexamethyidisilazane
HEXAMETHYLDISILAZANE [HSDB]
NSC93895
STR02905
1,1,1,3,3,3-hexamethyldisilazan
Tox21_202428
Tox21_303281
1,1,1,3,3,3 hexamethyldisilazane
1,1,1,3,3,3-hexamethyidisilazane
1,1,1.3,3,3-hexamethyldisilazane
NSC252161
STL185550
Disilazane,1,1,3,3,3-hexamethyl-
1,1,1, 3,3,3-hexamethyldisilazane
1,1,1,3,3,3,-hexamethyldisilazane
AKOS000120987
ZINC169743012
NCGC00164366-01
NCGC00164366-02
NCGC00257230-01
NCGC00259977-01
BP-21394
FT-0602799
H0089
Hexamethyldisilazane, reagent grade, >=99%
Hexamethyldisilazane, ReagentPlus(R), 99.9%
Silanamine,1,1-trimethyl-N-(trimethylsilyl)-
WLN: 1-SI-1&1&M-SI-1&1&1
Disilazane,1,1,3,3,3-hexamethyl-, lithium salt
Q425001
J-519891
F0001-2345
Silanamine,1,1-trimethyl-N-(trimethylsilyl)-, lithium salt
Hexamethyldisilazane, for GC derivatization, >=99.0% (GC)
Hexamethyldisilazane, semiconductor grade PURANAL(TM) (Honeywell 17713)
Hexamethyldisilazane, produced by Wacker Chemie AG, Burghausen, Germany, >=97.0% (GC)
Hexamethyldisilazane
1,1,1,3,3,3-Hexamethyldisilazane
1,1,1-Trimethyl-N-(trimethylsilyl)silanamin [German] [ACD/IUPAC Name]
1,1,1-Trimethyl-N-(trimethylsilyl)silanamine [ACD/IUPAC Name]
1,1,1-Triméthyl-N-(triméthylsilyl)silanamine [French] [ACD/IUPAC Name]
213-668-5 [EINECS]
999-97-3 [RN]
Bis(trimethylsilyl)amine [Wiki]
disilazane, hexamethyl-
H36C68P1BH
Hexamethyldisilylamine
hmds
JM9230000
MFCD00008259 [MDL number]
Silanamine, 1,1,1-trimethyl-N- (trimethylsilyl)-
Silanamine, 1,1,1-trimethyl-N-(trimethylsilyl)- [ACD/Index Name]
Silazane HMN
((CH3)3Si)2NH
(TMS)2NH
[dimethyl-(trimethylsilylamino)silyl]methane
1,1,1,3,3,3-Hexamethyl-disilazane
136068-19-4 [RN]
Bis(trimethylsilyl)amine; HMDS
dimethyl-[methyl(trimethylsilyl)amino]silicon
Disilazane, 1,1,1,3,3,3-hexamethyl-
DISILAZANE,HEXAMETHYL
EINECS 213-668-5
hexamethyl disilazane
HEXAMETHYLDISILIZANE
HEXAMETHYLSIDILIZANE
Hexamethylsilazane
HMDS; Bis(trimethylsilyl)amine
NCGC00164366-01
OAP
STR02905
Trimethyl-N-(trimethylsilyl)silanamine
Tri-Sil
UNII:H36C68P1BH
UNII-H36C68P1BH
WLN: 1-SI-1&1&M-SI-1&1&1